|Funding for:||UK Students, EU Students|
|Placed On:||12th February 2020|
|Closes:||11th May 2020|
Supervisors: Dr A Robinson and Prof J Preece
Tuition fees paid plus a stipend of £15,285 per annum
A fully funded 3-year PhD position is available in the School of Chemical Engineering at the University of Birmingham to start in Autumn 2020. The project will involve the development of novel resist materials for ultra-high resolution lithographic patterning with metastable helium atom beam lithography, helium ion beam lithography, and Bose-Einstein condensate holographic lithography. It will involve the processing of novel materials, such as self assembled monolayers, to form high quality ultrathin organic coatings on silicon substrates via both wet and vapour phase deposition techniques, and subsequent characterization of their properties, via ellipsometry, contact angle microscopy and in lithographic applications. The position will involve close collaboration with a second PhD in the School of Chemistry who will synthesize appropriate materials, and is part of a larger Europe-wide collaborative project to develop ultra-high resolution projection lithography techniques.
Applicants should hold a 1st or 2.1 class degree (or equivalent) in Chemical Engineering, Physics or Chemistry or a related discipline and be a UK/EU national (dual nationality is accepted if one is UK/EU). Experience of lithography, cleanroom techniques etc would be desirable. They should be a good communicator and team player.
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