| Qualification Type: | PhD |
|---|---|
| Location: | Coventry, University of Warwick |
| Funding for: | UK Students, EU Students, International Students |
| Funding amount: | £20,780 Stipend + Fees + Training Budget |
| Hours: | Full Time |
| Placed On: | 1st December 2025 |
|---|---|
| Closes: | 28th January 2026 |
| Reference: | HP-2026-016 |
About the project:
Multi-scale modelling of Thin Film Deposition with Flowable CVD for Next-gen Semiconductors
Supervisor: Dr Bora Karasulu, University of Warwick
This project, co-funded by Merck Electronics, will use computational simulations to study how thin films form during flowable chemical vapor deposition (FCVD), a process used to build advanced semiconductor devices.
Unlike traditional CVD, FCVD creates a liquid-like layer that fills narrow trenches on substrates before solidifying into films. We will model this across multiple scales, from atoms to fluid flow, using quantum chemistry, machine learning, molecular dynamics, and fluid mechanics.
We aim to understand how chemical structure of precursors and process conditions affect film quality, helping design better materials and manufacturing methods in close collaboration with the Merck experimental team.
About HetSys: Harnessing Data, Modelling and Simulation for Real‑World Impact
HetSys (Centre for Doctoral Training in Modelling of Heterogeneous Systems) at the University of Warwick is an innovative, interdisciplinary fully funded PhD programme that brings together science, engineering, and mathematics to tackle some of the most pressing challenges of our time.
If you’re excited by the idea of using advanced modelling and simulation to solve complex, real‑world problems, HetSys offers the perfect environment to push boundaries and make a difference.
Funding:
Awards for UK, EU, International applicants cover full University fees, give a research training budget and a tax-free stipend to cover living costs (standard UKRI rate £20780 in 25/26 - equivalent to national living wage).
Closing Date: 28/01/2026
Please apply via the ‘Apply’ button above.
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